Overview of 4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck

4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck is manufactured from high-purity aluminum oxide (Al₂O₃, 95%-99.8%), offering exceptional mechanical strength and thermal stability. These components are precision-engineered to meet strict tolerances, ensuring reliable performance in demanding environments. With a maximum operating temperature of 1800°C, they are widely used across industries including semiconductor, automotive, chemical processing, and medical equipment. Available in various shapes (rods, tubes, plates, washers) and surface finishes to suit specific application requirements.

Key Features of 4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck

Extreme Temperature Resistance – Withstands continuous operation up to 1800°C

Superior Mechanical Properties – High hardness (Mohs 9) and compressive strength

Excellent Wear & Corrosion Resistance – Outlasts metals in abrasive environments

Electrical Insulation – High dielectric strength for electronic applications

Chemical Inertness – Resistant to acids, alkalis and molten metals

Precision Manufacturing – Tight tolerances (±0.01mm) for critical applications

(4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck)

Specification of 4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck

These alumina permeable ceramic vacuum chucks are created wafer cleansing. They come in dimensions: 4 inch, 6 inch, 8 inch, and 12 inch sizes. The material is alumina ceramic. This ceramic is really difficult. It withstands use well. It takes care of high temperatures conveniently. Chemical resistance is excellent. Severe cleaning solutions won’t damage it.

The porous framework is crucial. Air flows with little interconnected pores. This produces a strong vacuum hold. Wafers stick safely to the surface area. The vacuum cleaner grip is consistent throughout the whole chuck face. This stops wafer slippage during washing or drying actions. The monotony is vital. Each chuck surface area is machined exactly. This ensures consistent contact with the wafer behind. No warping takes place. Consistent support is guaranteed.

Durability is a significant advantage. Alumina ceramic lasts a long time. It doesn’t deteriorate like some metals. Frequent exposure to acids or bases is fine. Thermal shock resistance is great. Sudden temperature changes won’t crack it. The product is additionally non-contaminating. It will not drop fragments onto sensitive wafers. Cleanroom compatibility is standard.

The vacuum cleaner system connects merely. Common fittings function. Setup is simple. Procedure is trustworthy. These chucks offer stable, repeatable wafer holding. They are vital for demanding cleaning processes. Efficiency is consistent set after batch. Upkeep needs are very little. Their durable style conserves downtime.

(4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck)

Applications of 4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck

Alumina permeable ceramic vacuum chucks are important devices for dealing with fragile wafers. They hold wafers firmly during cleansing and handling. This is necessary for semiconductor production. The porous ceramic product enables air to travel through it. A vacuum pump connects below the chuck. This pump pulls air with the ceramic pores. The vacuum pressure holds the wafer level against the chuck surface area. It protects against any type of movement or slippage. This secure hold is important for precision job.

These chucks are available in usual wafer sizes: 4-inch, 6-inch, 8-inch, and 12-inch diameters. You pick the size matching your wafer. The alumina ceramic material provides key advantages. It is exceptionally tough and resilient. It stands up to wear from constant usage. It likewise holds up against heats. Several wafer procedures involve heat. The ceramic stays steady. It is chemically inert. Severe cleaning chemicals won’t harm it. This is necessary for wafer cleansing steps.

The monotony of the chuck surface is critical. It makes certain the wafer rests completely level. This avoids stress or bending. The permeable framework supplies uniform vacuum suction across the entire wafer location. Every part of the wafer is held similarly. There are no vulnerable points. This harmony is essential for regular results. Throughout cleansing, the wafer should remain repaired. Solutions and washes circulation over it. The vacuum chuck maintains it stable. It protects against resonance or shifting. This guarantees complete and even cleaning. The chuck itself is simple to tidy. Particles or chemicals do not clog the pores easily. This keeps efficiency gradually. Alumina porous ceramic vacuum cleaner chucks offer trustworthy, precise wafer dealing with for demanding cleansing applications. They are fundamental devices in advanced electronics production.

Company Profile

Alumina Technology Co., Ltd,. We focus on the research and development, production and sales of alumina products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2005, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Alumina Boat, Alumina Crucible, Alumina Dish, Alumina Foam Filter, Alumina Plate, Alumina Rod, Alumina Bar, Alumina Balls, Filter Alumina, Nano Alumina Powder, Spherical Alumina Powder, ect. please feel free to contact us.(nanotrun@yahoo.com)

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of 4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck

Alumina Porous Ceramic Vacuum Chuck FAQs

What is this ceramic vacuum chuck used for? This chuck holds silicon wafers securely during cleaning or processing. It uses vacuum suction through tiny holes. The porous ceramic material is key. It provides a flat, stable surface. Wafers stay put without damage.

What sizes are available? We offer four standard sizes. You can get 4-inch, 6-inch, 8-inch, and 12-inch diameter chucks. These sizes match common wafer dimensions. Pick the size needed for your specific wafers.

What material is the chuck made from? It’s pure alumina ceramic. This material is very hard. It resists chemicals well. Alumina handles strong acids and bases used in wafer cleaning. It lasts a long time. The ceramic won’t wear down easily.

How does the vacuum work? Air gets pulled through the chuck’s porous structure. The chuck has many microscopic through-holes like a honeycomb. Connect the chuck to a vacuum pump. The pump creates suction. This suction holds the wafer firmly against the ceramic surface. The vacuum grip is strong and even.

How do you clean this chuck? Cleaning is simple. Use standard methods. Rinse it thoroughly with clean water. Mild detergents or isopropyl alcohol work well. Ultrasonic cleaning is very effective. Avoid harsh abrasives. They could damage the fine porous surface. Regular cleaning prevents particle buildup. This keeps the vacuum working properly. The ceramic itself stays clean. It doesn’t hold onto contaminants. This protects your wafers.

(4-6-8-12 Inch Alumina Porous Ceramic Vacuum Chuck Table Wafer Cleaning Chuck)