Overview of LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder

LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder is precision-engineered vessels made from 99%+ pure aluminum oxide (Al₂O₃). Designed for high-temperature and corrosive environments, they are widely used in semiconductor processing, heat treatment, CVD/PVD applications, and laboratory experiments. Their superior thermal and chemical stability ensures reliable performance under extreme conditions.

Key Features of LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder

Extreme Temperature Resistance – Stable up to 1800°C with low thermal expansion.

Superior Chemical Resistance – Resists acids, alkalis, and aggressive gases.

High Mechanical Strength – Durable and resistant to thermal shock.

Precision Design – Smooth surfaces & uniform dimensions for consistent processing.

Customizable Shapes & Sizes – Available in standard and tailored configurations.

(LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder)

Specifications of LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder

This LPCVD Cantilever Boat Ceramic Vacuum Chuck is developed for holding wafers securely during requiring semiconductor procedures. It uses high-purity alumina ceramic. This material is vital. Alumina uses impressive thermal security. It manages the extreme warm inside LPCVD heating systems quickly. Alumina also stands up to chemical strike from common processing gases. This avoids contamination. Your wafers stay cleaner.

The layout is a cantilever watercraft style. This shape provides exceptional accessibility for gas flow around the wafer. Consistent deposition is critical. This design helps accomplish that. The vacuum chuck mechanism is integrated. It produces a strong, trustworthy hang on the wafer bottom surface area. This grasp prevents any activity or slippage throughout processing. You get constant placing each time.

Precision dimensions are guaranteed. The chuck fits conventional LPCVD watercraft setups. It deals with usual wafer sizes. The surface encountering the wafer is completed to a really high standard. It is exceptionally level and smooth. This reduces physical call points. It lowers the danger of backside defects or bit generation. Safeguarding wafer high quality is the primary objective.

Thermal shock resistance is an additional vital function. Alumina ceramic handles fast temperature modifications well. This is important for furnace loading and dumping cycles. The product doesn’t warp or fracture quickly under anxiety. Lasting integrity issues. This chuck supplies it. Making use of alumina ceramic likewise indicates reduced particle generation. It maintains the process setting cleaner. This chuck gives a steady, safe and secure platform for slim film deposition. It guarantees consistent procedure results pursued run.

(LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder)

Applications of LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder

LPCVD cantilever watercraft ceramic vacuum chucks made from alumina ceramic are vital for holding wafers securely throughout high-temperature procedures. These owners use vacuum suction with tiny openings in the ceramic surface area. This suction holds silicon wafers or other substratums flat and immobile. The strong vacuum cleaner grip is essential for accuracy production steps.

Alumina ceramic is the perfect product for this laborious. It takes care of extreme warmth inside LPCVD heaters easily. Furnaces run very warm, often over 1000 ° C. Alumina remains solid and keeps its shape at these temperature levels. It protects against warping or breaking that might destroy the wafers. This product is additionally incredibly tough. It creates nearly no bits throughout usage. Maintaining things clean is important in semiconductor fabs. Alumina resists strike from harsh procedure gases and chemicals as well. It won’t contaminate the wafers.

These ceramic wafer owners are developed for LPCVD processes. LPCVD grows slim movies on wafers. The cantilever boat design is essential. It allows you tons and unload wafers efficiently from the heater tube. The vacuum chuck ensures each wafer rests completely level on the watercraft. Flatness is required for uniform movie deposition throughout the entire wafer surface. Any movement or bending causes flaws. The solid vacuum holds the wafer securely versus the ceramic surface. This stops any type of moving during handling.

You find these alumina vacuum chucks popular applications. Silicon wafer processing for integrated circuits is a major one. MEMS gadget production depends on them also. Compound semiconductor production utilizes them. Any process needing steady, particle-free wafer assistance at heats advantages. The combination of alumina ceramic and vacuum innovation supplies reliable, contamination-free handling. It directly boosts process yield and item top quality in sophisticated production.

Company Profile

Alumina Technology Co., Ltd,. We focus on the research and development, production and sales of alumina products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2005, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Alumina Boat, Alumina Crucible, Alumina Dish, Alumina Foam Filter, Alumina Plate, Alumina Rod, Alumina Bar, Alumina Balls, Filter Alumina, Nano Alumina Powder, Spherical Alumina Powder, ect. please feel free to contact us.(nanotrun@yahoo.com)

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder

What temperatures can this chuck handle?
It works well up to 1200°C. This high heat tolerance suits demanding LPCVD processes. The alumina ceramic material stays stable. It won’t warp or crack easily under thermal stress. Consistent performance is key.

What wafer sizes does it hold?
It handles common sizes like 4-inch, 6-inch, and 8-inch wafers. The design uses vacuum suction. This secures wafers firmly during processing. Wafers stay in place. They don’t slip or shift. Precise positioning is maintained.

How long does the chuck typically last?
With proper care, it lasts many process cycles. Alumina ceramic resists wear. It handles corrosive gases and high heat well. Regular checks help. Avoid physical impacts. Good maintenance extends its life significantly.

How do I clean the chuck?
Cleaning is straightforward. Use standard semiconductor cleaning solutions. Mild acids or solvents work fine. Avoid harsh abrasives. They can scratch the surface. Rinse thoroughly with deionized water afterward. Dry completely before reuse.

Why choose ceramic over metal?
Ceramic offers big advantages. It withstands extreme heat much better. It resists chemical corrosion effectively. Metal chucks often degrade faster. Ceramic provides stable, reliable support. Wafer contamination risk is lower. Performance is more consistent over time.

(LPCVD Cantilever Boat Ceramic Vacuum Chuck Alumina Ceramic Wafer Holder)