Overview of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial

0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial (α-Al₂O₃) is an advanced ceramic material with ultrafine particle sizes (20-200nm) and high purity (99.9%+). Its exceptional surface area, hardness, and thermal stability make it ideal for high-performance applications, including ceramics, coatings, catalysts, and composite materials.

Key Features of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial

Ultrafine Particle Size – 20-200nm for superior reactivity and dispersion.

High Purity (99.9%+) – Minimizes impurities for precision applications.

Excellent Thermal Stability – Withstands extreme temperatures (up to 1600°C).

Enhanced Mechanical Properties – Improves hardness, wear & corrosion resistance.

Wide Applications – Used in coatings, catalysts, electronics, and advanced ceramics.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial)

Specification of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial

This 0.3 Micron Aluminum Oxide Powder is extremely super fine quality alumina. It’s developed for requiring polishing jobs. Believe sapphire optics and important semiconductor surface areas. Achieving an absolutely smooth surface needs extreme precision. This powder delivers that.

The bit dimension is tightly managed. It averages 0.3 microns. That’s unbelievably small. Consistency matters a whole lot below. Consistent particles protect against scratching fragile surface areas. They make sure an even material removal price. This predictability is crucial in state-of-the-art manufacturing.

Alumina is really tough. It places simply listed below diamond on the solidity scale. This solidity makes it excellent for rough polishing. It efficiently cuts and improves surface areas. The powder itself is pure white. It’s chemically secure and inert. This security protects against unwanted reactions throughout polishing processes.

Semiconductor producing demands perfection. Surface imperfections destroy microchips. This alumina powder prepares wafer surface areas flawlessly. It removes tiny imperfections without including brand-new damages. The outcome is an ultra-smooth, defect-free coating. This is necessary for succeeding processing actions. Sapphire elements additionally need remarkable surface areas. This powder attains the needed optical clarity and level of smoothness.

Manage this material thoroughly. Wear appropriate protective gear. This includes a respirator mask. Fine powders can be unsafe if inhaled. Adhere to all safety guidelines for handling industrial abrasives. Store the powder in an awesome, completely dry place. Maintain the container secured snugly. This stops dampness absorption and contamination. Dampness impacts powder circulation and efficiency.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial)

Applications of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial

This 0.3 micron aluminum oxide powder is extremely incredibly great quality alumina. It’s necessary for brightening sapphire substratums in the semiconductor industry. Sapphire is very hard. It needs unique brightening to get an ultra-smooth surface. This fine alumina powder makes that occur.

The powder fragments are uniform. They are precisely 0.3 microns in size. This consistency is important. It enables regulated, also worldly removal during polishing. You get a surface area without deep scrapes or pits. A best surface is required for making semiconductor gadgets on sapphire.

Sapphire wafers are made use of for LEDs, RF chips, and sensors. These tools require atomically smooth surfaces. Blemishes trigger gadget failings. This alumina powder polishes the sapphire to near excellence. It gets rid of tiny flaws left by coarser polishing actions.

The powder functions well in chemical mechanical sprucing up (CMP) slurries. It additionally operates in traditional lapping substances. Its hardness efficiently cuts the sapphire surface. Yet the great bit dimension avoids harming the product below. You achieve a mirror surface dependably.

High purity is another crucial attribute. The powder has minimal metal contaminations. Contamination ruins semiconductor wafers. Pure alumina maintains the sapphire tidy during processing. This shields the expensive digital elements developed later on.

Operators value its predictable efficiency. The regular bit dimension gives repeatable results batch after batch. Manufacturing facilities need this integrity for high-volume production. It reduces waste and enhances returns.

This alumina powder is also made use of for last finishing silicon wafers often. It prepares surface areas for thin movie deposition. A remarkable surface area makes certain strong movie bond. It stops problems in the final semiconductor structure.

The ultra-fine quality is crucial for sophisticated applications. Demands for smoother surface areas maintain enhancing. This 0.3 micron powder satisfies the strictest requirements. It enables the production of advanced electronic devices.

Company Profile

Alumina Technology Co., Ltd,. We focus on the research and development, production and sales of alumina products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2005, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Alumina Boat, Alumina Crucible, Alumina Dish, Alumina Foam Filter, Alumina Plate, Alumina Rod, Alumina Bar, Alumina Balls, Filter Alumina, Nano Alumina Powder, Spherical Alumina Powder, ect. please feel free to contact us.(nanotrun@yahoo.com)

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial

What is this 0.3 micron aluminum oxide powder?
This powder is super fine alumina. We make it super pure. The particles average 0.3 microns in size. That’s extremely small. This fineness is key for precision work. It’s synthetic sapphire material. It works well for demanding polishing jobs.

Why is the particle size so critical?
The 0.3 micron size matters a lot. Smaller particles create finer finishes. They reduce scratches on delicate surfaces. This size is perfect for final polishing steps. It achieves near-mirror finishes. It’s essential for semiconductor wafers and optics. Larger particles cause damage.

Is this powder safe to handle?
Handle this powder carefully. It creates very fine dust. Breathing this dust is harmful. Always use proper safety gear. Wear an approved respirator. Wear safety glasses. Wear protective gloves. Work in well-ventilated areas. Avoid skin contact. Avoid inhaling any dust.

What are the main uses for this alumina powder?
Its main job is precision polishing. It polishes semiconductor silicon wafers. It polishes sapphire substrates. It polishes critical optical components. It works in Chemical Mechanical Planarization (CMP) slurries. It works in fine lapping compounds. It works for super-finishing metal parts.

How should I store this alumina powder?
Keep the powder sealed tight. Use its original container. Store it in a cool, dry place. Moisture is bad. Humidity can cause clumping. Avoid contamination. Keep it away from other chemicals. Ensure the lid is always secure. This keeps the powder dry and ready to use.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Polishing Sapphire for Semiconductor Industrial)