Overview of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial

0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial (α-Al₂O₃) is an advanced ceramic material with ultrafine particle sizes (20-200nm) and high purity (99.9%+). Its exceptional surface area, hardness, and thermal stability make it ideal for high-performance applications, including ceramics, coatings, catalysts, and composite materials.

Key Features of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial

Ultrafine Particle Size – 20-200nm for superior reactivity and dispersion.

High Purity (99.9%+) – Minimizes impurities for precision applications.

Excellent Thermal Stability – Withstands extreme temperatures (up to 1600°C).

Enhanced Mechanical Properties – Improves hardness, wear & corrosion resistance.

Wide Applications – Used in coatings, catalysts, electronics, and advanced ceramics.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial)

Specification of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial

This 0.3 micron light weight aluminum oxide powder is extremely incredibly fine quality alumina. It is created requiring commercial polishing work. It is especially good for optics and semiconductor job. Polishing sapphire substratums needs a product like this. Its severe excellence is vital. The average bit dimension is securely managed at 0.3 microns. This uniformity is crucial for achieving ideal surface areas. You obtain a scratch-free, mirror-like surface on tough materials. Sapphire is very hard. This alumina powder is hard adequate to cut it effectively. It removes product effectively. It leaves a remarkably smooth surface area behind.

The purity degree is incredibly high. It consists of 99.99% Al2O3. Impurities are maintained extremely reduced. This high purity is essential for semiconductor applications. Even small impurities can mess up delicate electronic components. This powder will not present harmful defects. It meets rigorous industry requirements for tidiness.

This alumina powder functions well in lots of brightening arrangements. Utilize it in slurries for chemical mechanical sprucing up (CMP). Use it in vibratory finishers. Use it in other accuracy lapping and polishing processes. Its fine bits develop less sub-surface damages. They produce premium surface quality contrasted to coarser qualities. The powder moves openly. It blends conveniently into fluid carriers. It disperses well for uniform polishing activity.

It is available in secured bags. It is available in larger drums. Manage it very carefully to stay clear of contamination. Keep it completely dry. Shop it secured in a clean place. This powder provides the performance needed for top-tier optics and semiconductor production.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial)

Applications of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial

This ultra-fine 0.3 micron aluminum oxide powder is important for demanding commercial polishing jobs. Its extreme solidity and consistent fragment size make it ideal for attaining remarkable surfaces on essential products. The small 0.3 micron dimension enables really great product elimination and smooth surface areas.

Semiconductor producing counts heavily on this powder. Brightening sapphire wafers is a vital application. Sapphire is tough. This alumina powder effectively eliminates surface area flaws without triggering deep scratches. The result is a completely smooth sapphire surface needed for high-performance semiconductor devices. Silicon wafer sprucing up additionally benefits. The powder refines the wafer surface area before more handling.

Optics making usages this powder extensively. Brightening lenses and mirrors calls for accuracy. The 0.3 micron fragments make certain minimal subsurface damage. This preserves the optical quality of glass, quartz, and specialty crystals. The great finish is critical for top quality optical elements.

Advanced ceramics additionally require this powder. Polishing complex ceramic components is challenging. This alumina powder manages intricate forms and limited tolerances. It creates a remarkable surface area finish on parts like insulators and substratums. Put on resistance improves dramatically after brightening.

Metal completing achieves high luster with this powder. Polishing precision steel components demands fine abrasives. This powder delivers an intense, reflective surface on stainless steel, titanium, and various other alloys. It removes fine scratches efficiently. The uniformity stops unequal sprucing up.

This 0.3 micron alumina powder provides constant outcomes. Its regulated fragment distribution protects against clumping. This ensures also worldly removal during sprucing up. Operators get predictable efficiency batch after set. Dependability is vital in state-of-the-art manufacturing environments.

Company Profile

Alumina Technology Co., Ltd,. We focus on the research and development, production and sales of alumina products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2005, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Alumina Boat, Alumina Crucible, Alumina Dish, Alumina Foam Filter, Alumina Plate, Alumina Rod, Alumina Bar, Alumina Balls, Filter Alumina, Nano Alumina Powder, Spherical Alumina Powder, ect. please feel free to contact us.(nanotrun@yahoo.com)

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of 0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial

Here are 5 FAQs about the 0.3 Micron Aluminum Oxide Powder for Semiconductor Polishing:

What is this 0.3 Micron Aluminum Oxide Powder? This is alumina powder. It is ultra super fine grade. The particle size is 0.3 microns. This powder is pure aluminum oxide. It is designed for precision polishing. It works especially well for hard materials like sapphire. Sapphire is used in semiconductors.

Why is the 0.3 micron size important? The size matters a lot. Smaller particles give a finer finish. They remove material slowly. They create very smooth surfaces. This is critical for semiconductor optics. Imperfections ruin performance. A 0.3 micron size avoids scratches. It achieves the needed surface perfection.

How does this powder work for sapphire polishing? Sapphire is extremely hard. Ordinary abrasives struggle. This alumina powder is very hard too. It matches sapphire well. The fine particles polish without deep scratches. They create an optically clear surface. This surface is ready for semiconductor use. The powder consistency ensures even material removal.

Is this powder safe to handle? Handle it carefully. Wear protective gear. Use gloves and safety glasses. Avoid breathing the dust. Fine powder can irritate lungs. Work in a ventilated area. Keep it away from moisture. Moisture clumps the powder. Store it sealed in a dry place. Follow all safety instructions.

How do I know the powder quality is good? We guarantee purity. The powder is high-grade alpha alumina. Particle size is tightly controlled. We test batches rigorously. We measure particle distribution. We check for contamination. Consistent results are essential. You get reliable performance every time. Quality is critical for semiconductor manufacturing.

(0.3 Micron Aluminum Oxide Powder ultra Super Fine Grade Alumina Powder Optics Polishing Sapphire for Semiconductor Industrial)